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Analysis of Fine Particles in LSI Using Auger Electron Spectroscopy (2)

[As of April, 2011]

Purpose
To find out the cause of film-like particles generation observed on the contact area after surface polishing.
Analysis and Result
As a result of Auger electron qualitative analysis, Si was detected in the particles and, in the CMP process of BPSG, Poly-Si of the bit contact was found adhered between BPSG layers.

This is [Figure 1 SEM Image].

Figure 1 SEM Image

This is [Figure 2 Auger Image of O + Si].

Figure 2 Auger Image of O + Si

This is [Figure 3 Auger Electron Image of ].

Figure 3 Auger Electron Image of O

This is [Figure 4 Auger Electron Image of Si].

Figure 4 Auger Electron Image of Si

This is [Figure 5 Auger Electron Energy Spectrum].

Figure 5 Auger Electron Energy Spectrum